| Аннотація | Explosive development of contemporary plasma based thin film and coating technologies resulted in expanding thin film/coating uses in diverse areas like micro-and optoelectronics, communications and information processing technology, storage and displayapplications, all kinds of coatings (optical, decorative, environmental and wear resistant), biotechnology, generation and conservation of energy.
Suggesting book is an attempt to fill the gap between great amount of literature devoted to applied and technological problems of films and coatings and the lack of fundamental knowledge about mechanisms of film/coating formation.
PREFACE…5
CHAPTER 1 PARTICULARITIES OF FORMATION OF FILMS DEPOSITED BY ION AND REACTIVE ION PLATING
1.1. Introduction…7
1.2.Principles of film deposition by ion plating…8
1.3. Effects producing by high energy particle bombardment on a condensation surface…9
1.4. Influence of ion bombardment on earlier stages of the film growth…10
1.4.1. Film growth on electrically conducti |